Technician in charge: Raul Solanas and Mengdi Qian
Scientist in charge: Florencio Sánchez

SCIENTIFIC & TECHNICAL SERVICES

Thin Films Laboratory

The Thin Films service allows for the fabrication of complex oxide thin films and other heterostructures, through Pulsed Laser Deposition (PLD), a technique particularly useful to create films with complex stoichiometry and to grow epitaxial films and heterostructures. Reflection high energy electron diffraction (RHEED) can be used for in-situ characterization. The sputtering technique is also available for metal deposition. Heterostructures combining metals and oxides can be fabricated in a single process.

Scientific equipment available

  • UHV Cluster for Pulsed Laser Deposition (PLD): The cluster includes a distribution chamber, two PLD chambers (one equipped with RHEED) and one sputtering chamber.
  • Excimer laser: The beam of an excimer laser (248 nm, 700 mJ, 10 Hz) is used for both PLD chambers.

USE OF THE SERVICE IN 2020

The Service has deposited 280 films and multilayers.

The research groups that have accessed to the Service are: MULFOX, SUMAN and N&N.

Outreach, publications and projects in which the service has participated

Main projects in which the service has participated in 2020:

Fundamentals and Enhanced Functionalities of Complex Ferroelectric Oxides
PROYECTOS DE I+D+i «RETOS INVESTIGACIÓN» ‐ CONVOCATORIA 2018, RTI2018-098537-B-C21
2018-2021

Main publications of the service in 2020:

Epitaxial Ferroelectric La-Doped Hf0.5Zr0.5O2 Thin Films
Song, Tingfeng; Bachelet, Romain; Saint-Girons, Guillaume; Solanas, Raul; Fina, Ignasi; Sanchez, Florencio
ACS Appl. Electron. Mater. 2020, 2, 10, 3221-3232 10.1021/acsaelm.0c00560

Coordination
Anna May-Masnou This email address is being protected from spambots. You need JavaScript enabled to view it.
Redaction
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Web & Graphic Editor
José Antonio Gómez  This email address is being protected from spambots. You need JavaScript enabled to view it.

Webmasters
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Albert Moreno     This email address is being protected from spambots. You need JavaScript enabled to view it.
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